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Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software

Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software

sku: 3320767075
1 In Stock

Obducat

Sindre Platform
US REUZEit West Coast US - R
30-Day Warranty On Part
$575,000.00
$649,000.00
-11% OFF
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Details

  • Category
    Molecular Biology
  • Dimension
    123.0in x 48.0in x 92.0in
  • Serial
    Does Not Apply
  • Shipping Type
    Freight
  • Manufacturing
    Does Not Apply
  • Voltage / Hertz
    400V / 50Hz/60Hz

Description

Product Information

The Obducat Sindre Platform is an advanced nanoimprint lithography system engineered for large-scale nano-scale pattern replication. It features a Roll-to-Plate configuration for efficient processing of flexible and rigid substrates. This pre-owned equipment shows minimal cosmetic wear and includes a computer with software. Suitable for Optics, Photonics, Bio-Medical Devices, and more, it provides reliable high-volume manufacturing with high throughput and yield. The system incorporates SoftPress® and IPS® technologies for imprint uniformity and contamination control. Ensure professional installation and testing in an appropriate facility to achieve optimum performance.


Technician comment

System could not be fully tested; proper facility requirements (dedicated power, utilities, and setup) were not available at the time of inspection. System is pre-owned and was sourced from a working environment. Visual inspection shows minimal cosmetic wear consistent with normal previous use. Overall condition appears intact. Recommend installation in an appropriate facility and full operational testing by qualified personnel prior to use.


Key Features
  • Roll-to-Plate (R2P) nanoimprint technology
  • SoftPress® ensures imprint uniformity
  • IPS® technology for contamination control
  • High throughput and repeatability
  • Automated substrate handling
  • Includes computer and software

Specifications
  • Imprint Pressure: 5 to 50 bar, Accuracy ± 1 bar
  • Imprint Temperature Range: Ambient to 200°C
  • UV Wavelength: 365nm
  • Substrate Size: 2-8 inch Ø
  • Throughput: Up to 70 wafers per hour
  • Mini Environment: Class 10 (when installed in Class 100 cleanroom)

Weight

Imperial: 4920.0 Pounds

Metric: 2231.67 Kilograms


Shipping Dimensions

Imperial: 147.6 lb x 57.6 lb x 110.4 lb

Metric: 374.9 cm x 146.3 cm x 280.42 cm


Harmonized Code

848620


Harmonized Code Details

848620: Machines for the manufacture of semi-conductor devices or of electronic integrated circuits. This code is applicable as the system is designed for nanoimprint lithography, a key process in semiconductor manufacturing.