Obducat Sindre Platform Nanoimprint Lithography System Includes Computer/Software
Obducat
Details
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CategoryMolecular Biology
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Dimension123.0in x 48.0in x 92.0in
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SerialDoes Not Apply
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Shipping TypeFreight
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ManufacturingDoes Not Apply
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Voltage / Hertz400V / 50Hz/60Hz
Description
The Obducat Sindre Platform is an advanced nanoimprint lithography system engineered for large-scale nano-scale pattern replication. It features a Roll-to-Plate configuration for efficient processing of flexible and rigid substrates. This pre-owned equipment shows minimal cosmetic wear and includes a computer with software. Suitable for Optics, Photonics, Bio-Medical Devices, and more, it provides reliable high-volume manufacturing with high throughput and yield. The system incorporates SoftPress® and IPS® technologies for imprint uniformity and contamination control. Ensure professional installation and testing in an appropriate facility to achieve optimum performance.
Technician comment
System could not be fully tested; proper facility requirements (dedicated power, utilities, and setup) were not available at the time of inspection. System is pre-owned and was sourced from a working environment. Visual inspection shows minimal cosmetic wear consistent with normal previous use. Overall condition appears intact. Recommend installation in an appropriate facility and full operational testing by qualified personnel prior to use.
Key Features
- Roll-to-Plate (R2P) nanoimprint technology
- SoftPress® ensures imprint uniformity
- IPS® technology for contamination control
- High throughput and repeatability
- Automated substrate handling
- Includes computer and software
Specifications
- Imprint Pressure: 5 to 50 bar, Accuracy ± 1 bar
- Imprint Temperature Range: Ambient to 200°C
- UV Wavelength: 365nm
- Substrate Size: 2-8 inch Ø
- Throughput: Up to 70 wafers per hour
- Mini Environment: Class 10 (when installed in Class 100 cleanroom)
Weight
Imperial: 4920.0 Pounds
Metric: 2231.67 Kilograms
Shipping Dimensions
Imperial: 147.6 lb x 57.6 lb x 110.4 lb
Metric: 374.9 cm x 146.3 cm x 280.42 cm
Harmonized Code
848620
Harmonized Code Details
848620: Machines for the manufacture of semi-conductor devices or of electronic integrated circuits. This code is applicable as the system is designed for nanoimprint lithography, a key process in semiconductor manufacturing.
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