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Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production
Obducat Sindre Nanoimprint System R2P Platform High Volume Production

Obducat Sindre Nanoimprint System R2P Platform High Volume Production

sku: 3320767075
1 In Stock

Obducat

Sindre Platform
US REUZEit West Coast US - R
30-Day Warranty On Part
$649,000.00
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Details

  • Category
    Production / Manufacturing
  • Dimension
    123.0in x 48.0in x 92.0in
  • Serial
    Does Not Apply
  • Shipping Type
    Freight
  • Manufacturing
    Does Not Apply
  • Voltage / Hertz
    400V / 50Hz/60Hz

Description

Product Information

The Obducat Sindre Platform is a pre-owned nanoimprint lithography system suited for high-volume production of nano- and micro-scale patterns. With its fully automated design, this system offers competitive cost-of-ownership, exceptional throughput, and sub-50nm resolution. Key technologies include SoftPress for imprint uniformity, IPS technology for improved stamp life, and STU technology for simultaneous thermal and UV processes. It supports a range of applications including optics, bio-medical devices, and LED displays. Configurable for multiple substrate sizes and shapes, it operates on 400V with a built-in computer and software. Ideal for cleanroom installations.


Technician comment

System could not be fully tested; proper facility requirements (dedicated power, utilities, and setup) were not available at the time of inspection. System is pre-owned and was sourced from a working environment. Visual inspection shows minimal cosmetic wear consistent with normal previous use. Overall condition appears intact. Recommend installation in an appropriate facility and full operational testing by qualified personnel prior to use.


Key Features
  • Fully automated nanoimprint lithography for high-volume production
  • SoftPress technology ensures imprint uniformity
  • IPS improves stamp life and contamination control
  • STU combines thermal and UV imprint processes
  • Compatible with substrates from 2-8 inch Ø
  • Throughput up to 70 wafers per hour
  • Operates on 400V, includes computer and software

Specifications
  • Substrate size: 2-8 inch Ø
  • Throughput: Up to 70 wafers per hour
  • Imprint pressure: 5-50 bar
  • Imprint temperature: Ambient to 200°C
  • UV light wavelengths: 365 nm, 100 mW/cm²
  • Imprinted resolution: Sub 50nm
  • Power requirements: 400 VAC, 3 phase, 50/60 Hz, 20 kVA
  • Compressed air: 6-8 bar, with peak at 100 l/min
  • High pressure nitrogen or air: 60 bar pressure, consumption 15 l/min
  • Exhaust outlets: 3, plus one for the chiller, 4500 l/min flow

Weight

Imperial: 4920.0 Pounds

Metric: 2231.67 Kilograms


Shipping Dimensions

Imperial: 147.6 lb x 57.6 lb x 110.4 lb

Metric: 374.9 cm x 146.3 cm x 280.42 cm


Harmonized Code

847989


Harmonized Code Details

847989 - Machines and mechanical appliances having individual functions, not specified or included elsewhere in this chapter; because the product is a specialized machinery for manufacturing nano-scale patterns, it reasonably falls under this category.