Coherent COMPex Pro 110 F Excimer UV Laser System Installed Micronanics Enclosure
Coherent/Micronanics
Details
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CategoryLaser
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Dimension78.0in x 75.0in x 87.0in
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SerialGEP.1113838.10068
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Shipping TypeFreight
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ManufacturingDoes Not Apply
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Voltage / Hertz230V / 50Hz/60Hz
Description
This Micronanics MicroNano System featuring the Coherent COMPex Pro 110 F excimer UV laser, manufactured in 2013 by Coherent GmbH, is engineered for precision microfabrication, laser marking, and material processing. The system, equipped with Coherent EnergyMax software for laser operations, supports micro/nanoscale accuracy with precision X, Y, Z stages. The enclosure design ensures Class 1 laser safety compliance, featuring heavy-duty metal construction and laser-safe viewing windows. It offers robust functionality in advanced laboratories or manufacturing environments, accommodating applications such as semiconductor lithography, material processing, mask inspection, and advanced scientific research. This advanced excimer UV laser delivers stability, high pulse energy, and beam uniformity, making it suitable for high-precision tasks across diverse fields.
Technician comment
This Micronanics MicroNano System with the Coherent COMPex Pro 110 F excimer laser, was sourced from an operational environment and has been maintained in excellent cosmetic condition. Only minimal signs of prior use are present, (Acer display has minor damage (cracked screen on top right & bottom left corner) but doesn't affect functionality. The Micronanics enclosure powers on successfully, but complete functional testing is pending user login credentials for full access to system functions. Coherent EnergyMax software for laser operations and Micronanics MNA Drilling Tool software for advanced microfabrication applications installed. Overall, this unit is preowned but shows light wear from previous use.
Key Features
- High-performance excimer UV laser
- Wavelengths 193 nm, 248 nm, 308 nm, 351 nm
- Pulse energies up to 30 W per pulse
- Compact and rugged construction
- Excellent pulse-to-pulse energy stability
- Supports semiconductor lithography and material processing
- Long-lasting components with improved gas processing
- Flexible integration for quick start-up
Specifications
- Laser Type: Excimer (Gas) Laser, Pulsed UV
- Wavelength Range: 193 nm, 248 nm, 308 nm, 351 nm
- Pulse Energy: Up to 400 mJ
- Repetition Rate: 0–100 Hz
- Pulse Width: 25 ns
- Beam Profile: Flat top with variable spot size
- Beam Divergence: 3 x 1 mrad
- Peak Power: Up to 110 watts
Weight
Imperial: 2400.0 Pounds
Metric: 1088.62 Kilograms
Shipping Dimensions
Imperial: 93.6 lb x 90.0 lb x 104.4 lb
Metric: 237.74 cm x 228.6 cm x 265.18 cm
Harmonized Code
9013.20.00.00
Harmonized Code Details
9013.20.00.00 - Lasers, other than laser diodes, used in material processing and scientific research due to their precision, energy stability, and range of application.
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