Sitek 4300-S Spin Rinse Dryer 300mm Wafer Processing
Sitek Process Solutions
Details
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CategoryProcess / Scale-Up
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Dimension25.0in x 35.0in x 60.0in
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SerialSRD-01165
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Shipping TypeFreight
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Manufacturing2019-10-01
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Voltage / Hertz120V / 50Hz/60Hz
Description
The Sitek Process Solutions 4300-S Semitool 4300 Spin Rinse Dryer (SRD) is a pre-owned semiconductor wet processing system designed for rinsing silicon wafers with deionized water and drying them using high-speed spinning and heated nitrogen. Manufactured in 2019, this standalone unit is mounted on a wheeled base for enhanced mobility and storage efficiency. It features a brushless motor, labyrinth seal, single-bolt quick-disconnect rotor, and Class 10 polypropylene skins. The system is capable of processing wafers up to 300mm in diameter, making it suitable for modern semiconductor fabrication facilities. While the unit powers on, buyers should validate its suitability for specific applications as full functional testing was not conducted.
Technician comment
Pre-owned Semitool 4300 Spin Rinse Dryer (SRD) removed from a working semiconductor facility. The unit powers on successfully; however, full functional testing could not be performed because the required DI water, nitrogen supply, and process utilities were unavailable. Cosmetic condition shows minor signs of normal industrial use. Please see photos for details.
Key Features
- Brushless motor
- Labyrinth seal
- Single-bolt quick-disconnect rotor
- Class 10 polypropylene skins
- Processes up to 300mm wafers
- Mounted on wheeled base
Specifications
- Voltage: 120V
- Hertz: 50Hz/60Hz
Weight
Imperial: 360.0 Pounds
Metric: 163.29 Kilograms
Shipping Dimensions
Imperial: 30.0 in x 42.0 in x 72.0 in
Metric: 76.2 cm x 106.68 cm x 182.88 cm
Harmonized Code
847982
Harmonized Code Details
HS Code 847982: Machines and mechanical appliances having individual functions, not specified or included elsewhere. Suitable for semiconductor processing equipment.
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